Excimer laser-induced chemical vapor deposition of titanium silicide

Gupta, A.; West, G. A.; Beeson, K. W.
November 1985
Journal of Applied Physics;11/1/1985, Vol. 58 Issue 9, p3573
Academic Journal
Presents information on a study that used a pulsed ArF excimer laser to deposit thin conductive films of titanium silicide on silicon and silicon oxide substrates. Experimental procedure; Results and discussion; Conclusions.


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