TITLE

Excimer laser-induced chemical vapor deposition of titanium silicide

AUTHOR(S)
Gupta, A.; West, G. A.; Beeson, K. W.
PUB. DATE
November 1985
SOURCE
Journal of Applied Physics;11/1/1985, Vol. 58 Issue 9, p3573
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents information on a study that used a pulsed ArF excimer laser to deposit thin conductive films of titanium silicide on silicon and silicon oxide substrates. Experimental procedure; Results and discussion; Conclusions.
ACCESSION #
7649218

 

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