HF- and NH4OH-treated (111)Si surfaces studied by spectroscopic ellipsometry

Utani, Katsuyuki; Suzuki, Takahiro; Adachi, Sadao
April 1993
Journal of Applied Physics;4/1/1993, Vol. 73 Issue 7, p3467
Academic Journal
Examines the etching characteristics of native SiO[sub2] films and surface properties of HF-treated silicon by spectroscopic ellipsometry. Best fit parameters for HF- and NH[sub4]OH-treated silicon; Steps in etching SiO[sub2] films on silicon in HF and NH[sub4]OH solutions; Facts on the wettability measurement technique for detecting changes in silicon and SiO[sub2] surfaces.


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