Photoproduction and dynamics of oxygen atoms in xenon matrices

Ryan, E. Todd; Weitz, Eric
July 1993
Journal of Chemical Physics;7/15/1993, Vol. 99 Issue 2, p1004
Academic Journal
The photodissociation of N2O doped in Xe matrices and the subsequent dynamics of atomic oxygen production have been studied. The O atom concentration is monitored via the laser-induced fluorescence of XeO exciplexes produced by the 193 nm excitation of Xe/O pairs. The O atom photoproduction cross section for 193 nm irradiation of N2O is 6.4±1.0×10-20 cm2 at 27 K, comparable to the gas phase value of 1.1×10-19 cm2. Dissociation of XeO exciplexes generates kinetically hot O atoms which are mobile. This photoinduced mobility can lead to O atom loss by recombination. The extent of O atom production as a function of laser irradiation is governed by a competition between the rates of photoproduction and photoinduced loss. The effects of temperature, concentration, and laser fluence on the production of O atoms are considered. The efficiency of photoinduced O atom loss increases significantly with increasing temperature. An ultraviolet absorption spectrum of XeO has been obtained with an absorption cross section of 1.9±0.4×10-16 cm2 at 248 nm.


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