Thin-film interactions in Si/SiO2/W-Ti/Al-1% Si system

Chang, Peng-Heng; Liu, Hung-Yu; Keenan, J. A.; Anthony, J. M.; Bohlman, J. G.
September 1987
Journal of Applied Physics;9/15/1987, Vol. 62 Issue 6, p2485
Academic Journal
Provides information on a study which investigated the thin-film metal-metal interactions in a silicon compound system using transmission electron microscopy, glancing angle x-ray diffraction, Rutherford backscattering spectrometry. Methods; Results; Discussion.


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