Co diffusion and precipitation in Si/SiGe heterostructures

Dekempeneer, E. H. A.; Zalm, P. C.; Vriezema, C. J.; van den Heuvel, R. A.
October 1991
Journal of Applied Physics;10/15/1991, Vol. 70 Issue 8, p4263
Academic Journal
Presents a study that demonstrated cobalt diffusion and precipitation in silicon/silicon germanide heterostructures. Procedures in the preparation of a sample grown by molecular-beam epitaxy; Description of the germanium-implanted samples produced; Analysis of the secondary-ion mass spectrometry measurements of the cobalt depth distribution.


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