Interfacial reactions of Cr, Cr-Si, and Cr/Si films on GaAs

Huang, T. S.; Yang, M. S.
November 1991
Journal of Applied Physics;11/15/1991, Vol. 70 Issue 10, p5675
Academic Journal
Examines the interfacial reactions of chromium, chromium-silicon and chromium/silicon films on gallium arsenide substrate. Experimental procedures; Use of x-ray diffractometry and Rutherford backscattering spectrometry; Findings of the study.


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