TITLE

Nucleation of diamond during hot filament chemical vapor deposition

AUTHOR(S)
Singh, Jogender; Vellaikal, M.
PUB. DATE
March 1993
SOURCE
Journal of Applied Physics;3/15/1993, Vol. 73 Issue 6, p2831
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a study that investigated the mechanism of nucleation of diamond during hot filament chemical vapor deposition (HFCVD) process by high resolution transmission electron microscopy. Nucleation and growth characteristics of crystalline diamond; Details on the steps involved during the HFCVD process; Evidence for the formation of a diamond-like amorphous carbon with small diamond microcrystallites.
ACCESSION #
7634131

 

Related Articles

  • Nucleation enhancement of diamond with amorphous films. Barnes, Paul N.; Wu, Richard L.C. // Applied Physics Letters;1/4/1993, Vol. 62 Issue 1, p37 

    Examines the nucleation and growth of diamond on pretreated silicon substrates. Use of microwave plasma enhanced chemical vapor deposition technique; Density average of diamond nucleation; Result of diamond deposition without pretreatment.

  • Study on bias-enhanced nucleation of diamonds by simulating the time dependence of bias current. Perng, Kuoguang; Liu, Kuo-Shung; Lin, I-Nan // Journal of Applied Physics;3/15/2002, Vol. 91 Issue 6, p3934 

    The kinetics of bias-enhanced nucleation (BEN) of diamonds in microwave plasma-enhanced chemical vapor deposition were investigated. During a BEN step, the increase of bias current was proportional to the area covered by diamond nuclei. This result provided information regarding the kinetics of...

  • Nucleation and bulk film growth kinetics of nanocrystalline diamond prepared by microwave plasma-enhanced chemical vapor deposition on silicon substrates. Lee, Joungchel; Hong, Byungyou; Messier, R.; Collins, R. W. // Applied Physics Letters;9/16/1996, Vol. 69 Issue 12, p1716 

    Real time spectroscopic ellipsometry has been applied to characterize the substrate temperature (T) dependence of the deposition rates for nanocrystalline diamond thin films prepared by microwave plasma-enhanced chemical vapor deposition on seeded Si substrates. With the real time capability, it...

  • A model kinetics for nucleation at a solid surface with application to diamond deposition from the gas phase. Tomellini, M.; Polini, R.; Sessa, V. // Journal of Applied Physics;12/15/1991, Vol. 70 Issue 12, p7573 

    Focuses on a model kinetics that should represent a guideline for describing the nucleation process at solid substrate as it occurs in the chemical vapor deposition process. Processes comprising the kinetic scheme; Conditions of low surface coverage; Application to diamond deposition.

  • Diamond nucleation on cleaved Si(111). Polini, Riccardo // Journal of Applied Physics;9/15/1992, Vol. 72 Issue 6, p2517 

    Presents information on a study that investigated the nucleation of diamond from a gas phase in a hot filament assisted chemical vapor deposition. Discussion on the nucleation density in diamond deposition; Background on diamond crystallites.

  • Early formation of chemical vapor deposition diamond films. Iijima, Sumio; Aikawa, Yumi; Baba, Kazuhiro // Applied Physics Letters;12/17/1990, Vol. 57 Issue 25, p2646 

    Nanometer-size diamond particles formed on a silicon substrate by the hot-filament chemical vapor deposition method were examined by a high-resolution electron microscope. The particles developed well-faceted cuboctahedral habits. Examination of their morphologies and microstructures provides a...

  • Preparation of textured diamond films on Si substrates by hot-filament chemical-vapor deposition. Ikoma, Keiko; Yamanaka, Mitsugu // Journal of Applied Physics;9/1/1993, Vol. 74 Issue 5, p3519 

    Presents information on a study which deposited diamond on silicon(111) substrates by a two-step hot-filament chemical vapor deposition method consisting of the pretreatment and growth processes. Experimental procedure; Characterization of the products by scanning electron microscopy; Formation...

  • Effects of Ti- and Zr-Based Interlayer Coatings on Hot-Filament Chemical Vapor Deposition of Diamond on High-Speed Steel. Polini, R.; Mantini, F. Pighetti; Braic, M.; Amar, M.; Ahmed, W.; Taylor, H.; Jackson, M. J. // Journal of Materials Engineering & Performance;Apr2006, Vol. 15 Issue 2, p4 

    The prospect of obtaining good adhesion of diamond films onto steel substrates is highly exciting because the achievement of this objective will open up numerous new applications in industry. However, a major problem with depositing diamond onto steel is high diffusion of carbon into steel at...

  • Nucleation and Growth of Diamond Film on Porous Silicon Substrate. Liao, Y.; Fang, R. C.; Ye, F.; Shao, Q. Y.; Wang, G. Z. // Modern Physics Letters B;2/28/99, Vol. 13 Issue 5, p159 

    Nucleation and growth of diamond film on porous silicon are investigated in a hotfilament chemical vapor deposition system. The characters of diamond film are determined by scanning electronic microscopy, Raman spectra and X-ray photoelectron spectroscopy. A nucleation density of 3.6 ×...

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics