TITLE

Interfacial reactions of iron thin films on silicon

AUTHOR(S)
Cheng, H. C.; Yew, T. R.; Chen, L. J.
PUB. DATE
June 1985
SOURCE
Journal of Applied Physics;6/15/1985, Vol. 57 Issue 12, p5246
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a study which investigated interfacial reactions of iron thin films on silicon by transmission electron microscopy. Characteristics of iron, cobalt and nickel; Experimental procedures followed; Discussion on micrograph of as-deposited samples; Results of vacuum annealing.
ACCESSION #
7632990

 

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