TITLE

X-ray diffraction and ion backscattering study of thermally annealed Pd/SiC and Ni/SiC

AUTHOR(S)
Pai, C. S.; Hanson, C. M.; Lau, S. S.
PUB. DATE
January 1985
SOURCE
Journal of Applied Physics;1/15/1985, Vol. 57 Issue 2, p618
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the reactions of palladium/silicon carbide and nickel/silicon carbide samples during thermal annealing by X-ray diffraction and megaelectronvolt ion backscattering spectrometry. Reason for the increasing technological interest in the properties of metal-silicon carbide; Phase identifications obtained from X-ray diffraction; Comparison between the interactions of palladium/silicon carbide and nickel/silicon carbide from the interactions of palladium/silicon and nickel/silicon.
ACCESSION #
7629999

 

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