TITLE

ASML Putting ALD on Fast Track

AUTHOR(S)
Chappell, Jeff
PUB. DATE
September 2002
SOURCE
Electronic News;9/16/2002, Vol. 48 Issue 38, p16
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the decision of tool maker ASML to license its atomic layer deposition (ALD) tool. Other product of ASML; Reason for high demand for ALD tool; Information on the ALD developed by Samsung Electronics Co. Ltd.
ACCESSION #
7391511

 

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