TITLE

Cymer's EUV source moves closer to production

AUTHOR(S)
Wallace, John
PUB. DATE
December 2011
SOURCE
Laser Focus World;Dec2011, Vol. 47 Issue 12, p17
SOURCE TYPE
Periodical
DOC. TYPE
Article
ABSTRACT
The article reports on the development of a high-volume manufacturing (HVM) laser produced plasma (LPP) system of Cymer Inc., a lithographic light source producer. It states that plasma system uses a 13.5 nanometer (nm) lithographic light for its optical lithography process. It mentions that the process focuses on the 10.6 μm light generated from a carbon dioxide (CO2) laser to falling droplets of tin with 30-μm diameter that produces extreme ultraviolet radiation (EUV).
ACCESSION #
70551630

 

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