Formation of nanosize structures on a silicon substrate by method of focused ion beams

Ageev, O.; Kolomiytsev, A.; Konoplev, B.
December 2011
Semiconductors;Dec2011, Vol. 45 Issue 13, p1709
Academic Journal
The results of experimental studies of modes in which nanosize structures are formed on a silicon substrate by method of focused ion beams are presented. Dependences of the diameter and depth of the nanosize structures on the ion beam current and time of exposure to the ion beam at a point are obtained. It is demonstrated that the main factor determining the rate of ion-beam milling is the ion beam current. The results of the study can be used in the development of technological processes for the fabrication of components for nanoelectronics and nanosystems engineering.


Related Articles

  • One-dimensional lateral growth of epitaxial islands on focused ion beam patterned substrates. Gray, J. L.; Nichols, P. L.; Hull, R.; Floro, J. A. // Journal of Applied Physics;Jan2013, Vol. 113 Issue 4, p044308 

    Lateral growth of highly elongated SiGe islands in one dimension has been achieved by ex-situ substrate patterning using a focused ion beam (FIB) to create an array of surface grooves in the Si substrate. Growth of Si0.7Ge0.3 on this template results in preferential formation of strain-relieving...

  • Fabrication and Application of Nanofork for Measuring Single Cells Adhesion Force inside ESEM. Ahmad, Mohd Ridzuan; Nakajima, Masahiro; Kojima, Masaru; Kojima, Seiji; Homma, Michio; Fukuda, Toshio // AIP Conference Proceedings;5/25/2011, Vol. 1341 Issue 1, p304 

    In this paper, single cell adhesion force was measured using a nanofork. The nanofork was used to pick-up a single cell on a line-patterned substrate inside ESEM. The line-patterned substrate was used to provide small gaps between the single cells and the substrate. Therefore, the nanofork could...

  • Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures. Wang, Houxiao; Zhou, Wei; Li, Er Ping // Journal of Nanomaterials;9/1/2015, p1 

    Plasmonic nanoscale devices/structures have gained more attention from researchers due to their promising functions and/or applications. One important technical focus on this rapidly growing optical device technology is how to precisely control and fabricate nanostructures for different...

  • Fabrication of one-dimensional programmable-height nanostructures via dynamic stencil deposition. Wasserman, J. L.; Lucas, K.; Lee, S. H.; Ashton, A.; Crowl, C. T.; Markovic, N. // Review of Scientific Instruments;Jul2008, Vol. 79 Issue 7, p073909 

    Dynamic stencil deposition (DSD) techniques offer a variety of fabrication advantages not possible with traditional lithographic processing, such as the ability to directly deposit nanostructures with programmable-height profiles. However, DSD systems have not enjoyed widespread usage due to...

  • Nissin Ion Doping System-H2+ Implantation for Silicon Layer Exfoliation. Cherekdjian, S.; Maschmeyer, R. O.; Cites, J.; Tatemichi, J.; Inouchi, Y.; Onoda, M.; Orihira, K.; Matsumoto, T.; Konishi, M.; Naito, M. // AIP Conference Proceedings;1/7/2011, Vol. 1321 Issue 1, p392 

    A Nissin iG4 ion doping system (termed iG4) utilizes broad beam technology to implant GEN 4 sheets of glass for LCD production. The mechanical scanned end-station with robotic handling for GEN 4 glass substrates was redesigned, and a new end-station was built to handle rectangular silicon tiles...

  • Snap-Through Instability of Graphene on Substrates. Teng Li; Zhao Zhang // Nanoscale Research Letters;Jan2010, Vol. 5 Issue 1, p169 

    We determine the graphene morphology regulated by substrates with herringbone and checkerboard surface corrugations. As the graphene–substrate interfacial bonding energy and the substrate surface roughness vary, the graphene morphology snaps between two distinct states: (1) closely...

  • FIB/SEM Structural Analysis Of Through-Silicon-Vias. Bender, H.; Drijbooms, C.; Radisic, A. // AIP Conference Proceedings;11/15/2011, Vol. 1395 Issue 1, p274 

    Different milling strategies for the structural analysis of through-silicon-vias with a dualbeam focused ion beam/scanning electron microscope are discussed. Particular attention is given to methods to reduce the analysis time and to minimize the curtaining artifacts.

  • Nanofabricated solid immersion lenses registered to single emitters in diamond. Marseglia, L.; Hadden, J. P.; Stanley-Clarke, A. C.; Harrison, J. P.; Patton, B.; Ho, Y.-L. D.; Naydenov, B.; Jelezko, F.; Meijer, J.; Dolan, P. R.; Smith, J. M.; Rarity, J. G.; O'Brien, J. L. // Applied Physics Letters;3/28/2011, Vol. 98 Issue 13, p133107 

    We describe a technique for fabricating micro- and nanostructures incorporating fluorescent defects in diamond with a positional accuracy better than hundreds of nanometers. Using confocal fluorescence microscopy and focused ion beam etching, we initially locate a suitable defect with respect to...

  • Growth of two-dimensional arrays of uncapped gold nanoparticles on silicon substrates. Das, Anindya; Das, Soma; Raychaudhuri, A. K. // Bulletin of Materials Science;2008, Vol. 31 Issue 3, p277 

    A method of preparing large area patterned 2D arrays of uncapped gold (Au) nanoparticles has been developed. The pattern has been formed using self-assembly of uncapped Au nanoparticles. The Au nanoparticles were synthesized via toluene/water two phase systems using a reducing agent and...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics