TITLE

NANOSTRUCTURED TITANIA FILMS PREPARED BY PI-MOCVD

AUTHOR(S)
Rosas, E. Rubio; Apátiga, L. M.; Rodríguez-Lugo, V.
PUB. DATE
January 2010
SOURCE
Acta Microscopica;2010, Vol. 19 Issue 1, p89
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
In the present work, titania films deposited on stainless steel substrate were prepared by pulsed liquid injection MOCVD; titanium isopropoxide was used as precursor and Ar as carrier gas, the substrate temperature was fixed in 600 °C. On the other hand, titania nanoparticles deposited on the hot-wall of the reactor were characterized. The materials were characterized by X-ray diffraction (XRD), transmission electron microscope (TEM), scanning electron microscope (SEM) and energy dispersive X-ray analysis (EDAX). Results obtained revealed that the films are constituted by titania with highly oriented anathase phase in the (200) direction and on the other hand, the particles collected in the reactor wall presented a range from 50 to 100 nm in size with a low intensity X-ray diffraction peaks of anatase phase. The average particle size.
ACCESSION #
69583511

 

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