TITLE

Anomalous resistivity effect on multiple ion beam emission and hard x-ray generation in a Mather type plasma focus device

AUTHOR(S)
Behbahani, R. A.; Aghamir, F. M.
PUB. DATE
October 2011
SOURCE
Physics of Plasmas;Oct2011, Vol. 18 Issue 10, p103302
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Multi ion beam and hard x-ray emissions were detected in a high inductance (more than 100 nH) Mather type plasma focus (PF) device at different filling gas pressures and charging voltages. The signal analysis was performed through the current trace, as it is the fundamental signal from which all of the phenomena in a PF device can be extracted. Two different fitting processes were carried out according to Lee's computational (snow-plow) model. In the first process, only plasma dynamics and classical (Spitzer) resistances were considered as energy consumer parameters for plasma. This led to an unsuccessful fitting and did not answer the energy transfer mechanism into plasma. A second fitting process was considered through the addition of anomalous resistance, which provided the best fit. Anomalous resistance was the source of long decrease in current trace, and multi dips and multi peaks of high voltage probe. Multi-peak features were interpreted considering the second fitting process along with the mechanisms for ion beam production and hard x-ray emission. To show the important role of the anomalous resistance, the duration of the current drop was discussed.
ACCESSION #
66903279

 

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