Measurement of the sheath capacitance of a planar probe

Oh, Se-Jin; Lee, Young-Kwang; Chung, Chin-Wook
October 2011
Physics of Plasmas;Oct2011, Vol. 18 Issue 10, p103511
Academic Journal
The sheath capacitance was measured on a planar probe dc-biased with respect to the plasma potential using the phase sensitive detection method in the region separated from the rf discharge plasmas by an immersed grid. It was observed that the sheath capacitance was negative when the collecting electrode of the probe was positioned downward toward the grid and biased near the plasma potential. This indicates that a double sheath had built up near the probe electrode. This tendency can be explained by the sheath capacitance, which is calculated using Poisson's equation with a non-zero electrical field and an ion velocity condition at the sheath edge.


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