TITLE

Sensitivity in extracting static dielectric constants from multiple film stacks

AUTHOR(S)
Mueller, A. H.; Suvorova, N. A.; Irene, E. A.
PUB. DATE
May 2002
SOURCE
Applied Physics Letters;5/13/2002, Vol. 80 Issue 19, p3596
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This study points out that there is a hyperbolic relationship between the static dielectric constants (Ks) in a dielectric film stack. It is shown using experimental data that this relationship renders K values that are extracted from capacitance–voltage measurements very sensitive to the other input values such as dielectric constants and film thicknesses. Errors as large as 100% and larger can be made in K from small changes in the input parameters. Thus there is a requirement for accurate film thicknesses and a specific knowledge of the nature of interface film(s) and dielectric properties are necessary for accurate K determinations. © 2002 American Institute of Physics.
ACCESSION #
6630255

 

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