TITLE

Note: Continuous synthesis of uniform vertical graphene on cylindrical surfaces

AUTHOR(S)
Bo, Zheng; Cui, Shumao; Yu, Kehan; Lu, Ganhua; Mao, Shun; Chen, Junhong
PUB. DATE
August 2011
SOURCE
Review of Scientific Instruments;Aug2011, Vol. 82 Issue 8, p086116
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This note describes a new reactor design for continuous synthesis of vertically oriented graphene (VG) sheets on cylindrical wire substrates using an atmospheric plasma-enhanced chemical vapor deposition (PECVD) system. Through combining a U-shaped reactor design with 'dynamic mode' synthesis featuring simultaneous rotational and axial movements of the metallic wire substrate, the new setup can enable continuous synthesis of VG sheets on the wire surface with remarkable uniformity in both circumferential and axial directions. In contrast, synthesis of VG at 'static mode' with a fixed substrate can only lead to non-uniform growth of VG sheets on the wire surface. Potential applications of the resulting uniform-VG-coated metallic wire could include field emitters, field-ionization-based neutral atom detectors, and indoor corona discharges.
ACCESSION #
65108867

 

Related Articles

  • Possibilities of application of plasma technologies to recycle organic-containing substances: Particularities of high current free burning arcs. Rutberg, A.; Vasileva, O.; Kumkova, I.; Safronov, A. // High Temperature;Mar2013, Vol. 51 Issue 2, p167 

    Studies of the free burning high current arcs fanned by weak nitrogen or argon flow, with parameters typical for plasmochemical reactors and currents of about 10 kA, are performed. The electrodes were made of carbon and metals. In this case we show that, under the arc stabilization by nitrogen...

  • Stabilization of the ionization overheating thermal instability in atmospheric pressure microplasmas. Staack, D.; Farouk, B.; Gutsol, A.; Fridman, A. // Journal of Applied Physics;Jul2009, Vol. 106 Issue 1, p13303 

    Stable direct current atmospheric pressure plasmas can regularly be generated in air using microplasma systems, and rapid cooling due to the small size is typically suggested as the thermally stabilizing mechanism. However, temperatures of the stable discharges are significantly higher than...

  • Plasma Composition by Mass Spectrometry in a Ar-SiH-H LEPECVD Process During nc-Si Deposition. Moiseev, T.; Chrastina, D.; Isella, G. // Plasma Chemistry & Plasma Processing;Feb2011, Vol. 31 Issue 1, p157 

    Mass spectrometry has been used to assess plasma composition during a low-energy plasma-enhanced chemical vapor deposition (LEPECVD) process using argon-silane-hydrogen (Ar-SiH-H) gas mixtures with input flows of 50 sccm Ar, 2-20 sccm SiH and 0-50 sccm H at total pressures of 1-4 Pa....

  • The growth mechanisms of graphene directly on sapphire substrates by using the chemical vapor deposition. Meng-Yu Lin; Chen-Fung Su; Si-Chen Lee; Shih-Yen Lin // Journal of Applied Physics;2014, Vol. 115 Issue 22, p223510-1 

    Uniform and large-area graphene films grown directly on sapphire substrates by using a lowpressure chemical vapor deposition system are demonstrated in this paper. The evolution process and the similar Raman spectra of the samples with different growth durations have confirmed that the...

  • Noncatalytic chemical vapor deposition of graphene on high-temperature substrates for transparent electrodes. Sun, Jie; Cole, Matthew T.; Lindvall, Niclas; Teo, Kenneth B. K.; Yurgens, August // Applied Physics Letters;1/9/2012, Vol. 100 Issue 2, p022102 

    A noncatalytic chemical vapor deposition mechanism is proposed, where high precursor concentration, long deposition time, high temperature, and flat substrate are needed to grow large-area nanocrystalline graphene using hydrocarbon pyrolysis. The graphene is scalable, uniform, and with...

  • Power dependence of NF3 plasma stability for in situ chamber cleaning. Bing Ji, Eugene J.; Elder, Delwin L.; Yang, James H.; Badowski, Peter R.; Karwacki, Eugene J. // Journal of Applied Physics;4/15/2004, Vol. 95 Issue 8, p4446 

    We investigated the stability of NF3 plasmas for in situ chamber cleaning in a production plasma-enhanced chemical vapor deposition reactor. An rf power threshold, normalized by NF3 molar number (Pnn) and NF3 flow rate (Pnf), is observed to be PnnPnf=39 (W/μ mol)(W/sccm) for stable plasmas...

  • Characterizations of the dc discharge plasma during chemical vapor deposition for diamond growth. Suzuki, Kazuhiro; Sawabe, Atsuhito; Inuzuka, Tadao // Applied Physics Letters;11/7/1988, Vol. 53 Issue 19, p1818 

    During the course of diamond growth by dc plasma chemical vapor deposition, characteristics of the plasma have been measured by means of the Langmuir single probe method and emission spectrometry. For the source gas system of hydrogen and methane (gas ratio: CH4/H2=2/100, total gas pressure:...

  • An observation of plasma inside of microwave boosted thruster. Oda, Yasuhisa; Nakagawa, Tatsuo; Komurasaki, Kimiya; Takahashi, Koji; Kasugai, Atsushi; Sakamoto, Keishi; Imai, Tsuyoshi // AIP Conference Proceedings;2004, Vol. 702 Issue 1, p399 

    Experiments on a pulsed microwave-beaming thruster were conducted using a millimeter-wave, high-power gyrotrons developed by the Japan Atomic Energy Research Institute. Plasma inside of 2-dimensional and axsymmetric parabola reflectors were observed using a high-speed camera. Propagation...

  • Development of Fast Ionization Wave Discharges at High Pulse Repetition Rates. Takashima, Keisuke; Adamovich, Igor; Czarnetzki, Uwe; Luggenhölscher, Dirk // Plasma Chemistry & Plasma Processing;Jun2012, Vol. 32 Issue 3, p471 

    Positive and negative polarity fast ionization wave discharges in nitrogen and dry air are studied in a rectangular geometry channel over a wide range of time delays between the discharge pulses, τ = 10 ms to 25 μs (pulse repetition rates of ν = 100 Hz-40 kHz). The discharge is...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics