TITLE

Temperature dependence of electrical properties of N[sub 2]O/O[sub 2]/N[sub 2]O-grown oxides on strained SiGe

AUTHOR(S)
Samanta, S. K.; Chatterjee, S.; Bera, L. K.; Banerjee, H. D.; Maiti, C. K.
PUB. DATE
April 2002
SOURCE
Applied Physics Letters;4/8/2002, Vol. 80 Issue 14, p2547
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Temperature dependence of electrical properties of split-N[sub 2]O grown oxides on strained SiGe layers by rapid thermal oxidation is reported. The reliability and thermal stability of ultrathin oxides have been examined by high frequency capacitance–voltage and current density versus electric field measurements. It is observed that at a low (<6 MV/cm) electric field, the shallow trap-assisted conduction mechanism is responsible for the leakage current below 100 °C and the Frenkel–Poole conduction dominates above 100 °C. At a high (>11 MV/cm) electric field, however, the leakage current is mainly governed by the Fowler–Nordheim tunneling. Charge-to-breakdown measurements at a constant current stressing show a higher reliability for the split-N[sub 2]O grown oxides. © 2002 American Institute of Physics.
ACCESSION #
6427067

 

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