Mechanism of atomic force microscopy anodization lithography on a mixed Langmuir–Blodgette resist of palmitic acid and hexadecylamine on silicon

Ahn, Sang Jung; Jang, Yun Kyeong; Lee, Haeseong; Lee, Haiwon
April 2002
Applied Physics Letters;4/8/2002, Vol. 80 Issue 14, p2592
Academic Journal
A degradation process of a resist was observed by an atomic force microscope (AFM) during AFM anodization lithography on a mixed Langmuir–Blodgett resist of palmitic acid and hexadecylamine. Based on the observation, we proposed a two-step mechanism as follows: (i) a partial degradation of the resist was first achieved and (ii) silicon oxide started to be grown in the presence of a resist. Lateral force microscopy was accomplished on the patterned area before and after the resist was stripped in order to confirm when the silicon oxide started to be grown in the area. This result provides us with the actual information on the mechanism of the anodization lithography on an organic resist. © 2002 American Institute of Physics.


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