Potential shielding by the surface water layer in Kelvin probe force microscopy

Sugimura, Hiroyuki; Ishida, Yuzuru; Hayashi, Kazuyuki; Takai, Osamu; Nakagiri, Nobuyuki
February 2002
Applied Physics Letters;2/25/2002, Vol. 80 Issue 8, p1459
Academic Journal
Studies the surface potential shielding effect of adsorbed water during Kelvin probe force microscopy (KFM) of silicon pn-structures covered with oxide layer. Hydrophobicity of the oxide layer; Surface potential contrast between the p and n-type regions of silicon; Application of KFM imaging in varied humidity test.


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