Electrical characteristics of TaSi[subx]N[suby]SiO[sub2]/Si structures by Fowler-Nordheim current analysis

You-Seok Suh; Heuss, Greg P.; Misra, Veena
February 2002
Applied Physics Letters;2/25/2002, Vol. 80 Issue 8, p1403
Academic Journal
Examines the electrical characteristics of TaSi[sub x]N[sub y]/SiO[sub 2]/Si structures. Application of Fowler-Nordheim tunneling analysis; Work function of TaSi[sub x]N[sub y] films; Mechanism that causes the increase of TaSi[sub x]N[sub y] work function.


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