Planar microwave devices fabricated by ion-implantation patterning of high-temperature superconductors

DeGroot, D. C.; Rudman, D. A.; Zhang, Kuan; Ma, Q. Y.; Kato, H.; Jaeger, N. A. F.
September 1996
Applied Physics Letters;9/30/1996, Vol. 69 Issue 14, p2119
Academic Journal
We have applied ion-implantation inhibit patterning as a new method of fabricating low-loss microwave transmission lines in high-temperature superconductor thin films. To determine the effectiveness of this technique, we fabricated coplanar waveguide transmission lines in YBa2Cu3O7-δ thin films that had been deposited on LaAlO3 substrates using pulsed laser deposition. Microwave characterizations of these lines are compared to a reference line fabricated with conventional ion milling. At 76 K and 12 GHz, the attenuation constants of the ion-implanted transmission lines are approximated 0.02 dB/mm, and the overall loss response is indistinguishable from that of the ion-milled device. © 1996 American Institute of Physics.


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