TITLE

Diamond-like carbon films grown by very high frequency (100 MHz) plasma enhanced chemical vapor deposition technique

AUTHOR(S)
Kumar, Sushil; Dixit, P. N.; Sarangi, D.; Bhattacharyya, R.
PUB. DATE
July 1996
SOURCE
Applied Physics Letters;7/1/1996, Vol. 69 Issue 1, p49
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Diamond-like carbon films were grown by VHF-PECVD technique. Since the self-bias potential developed in a VHF plasma is very low, sufficiently high negative dc voltage was applied to the substrates in order to make DLC film being grown reasonably hard. Also a comparative study of VHF grown films was made with rf (13.56 MHz) discharge grown films (grown in the same PECVD reactor). This made it possible to investigate the specific effects of excitation fre- quency while keeping other parameters constant. Deposition rate (rd) was found to be about 5 times higher for VHF grown films. Marginal variation in optical band gap (Eg) and refractive index (n) were observed in VHF grown films with variation in deposition parameters. Maximum value of hardness recorded was 1500 kg/mm2 in the case of rf and 902 kg/mm2 in the case of VHF grown films, within the range of deposition parameters. Stress values were in the range 1.7×109-2.9×109 Nm-2 for VHF and 3.6×109-4.6×109 Nm-2 for rf grown films. © 1996 American Institute of Physics.
ACCESSION #
6289144

 

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