Particle simulation of CH[sub 4]/H[sub 2] RF glow discharges for DLC film deposition

Farouk, B.; Nagayama, K.
August 2001
AIP Conference Proceedings;2001, Vol. 585 Issue 1, p230
Conference Proceeding
Particle-in-cell/Monte Carlo (PIC/MC) simulations of capacitively coupled radio-frequency (RF) glow discharges were carried out for low pressure CH[SUB4]/H[SUB2] plasmas. The present computational scheme considers the motions and collisions of both neutral and charged particles. The CH[SUB4]/H[SUB2] plasma is modeled by combining a one-dimensional PIC/MC method with a polyatomic particle collision scheme. The model considers the motions of neutrals CH[SUB4], CH[SUB3] , C[SUB2]H[SUB5], H[SUB2], and H, positive ions (CH[SUB +,SUP 4]) and electrons. Space and time dependent results show that ionization rate is high at the sheath region. Deposition rate of carbon film is calculated by sampling impinging particles at the powered electrode. When CH[SUB4] flow rate is decreased and the H[SUB2] flow rate is increased, the gas density in the chamber and deposition rate decreased significantly for carbon containing radicals. On the other hand, when CH[SUB4] flow rate is fixed and H[SUB2] flow rate is increased, deposition rate again decreased, but the gas density in the chamber did not change much.


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