Measurements of electron-impact-dissociation cross section for neutral products

Sugai, Hideo; Toyoda, Hirotaka
February 2000
AIP Conference Proceedings;2000, Vol. 500 Issue 1, p349
Academic Journal
Neutral radicals play key roles in plasma CVD and etching, and a comprehensive data base is needed on electron-impact-dissociation cross section for neutral radical production. This paper reviews the direct measurement of the neutral dissociation cross section accomplished by using appearance mass spectrometry in a dual-electron-beam system. The collision energy dependence of neutral dissociation cross sections is investigated for typical molecules used for plasma processing: CH[sub 4], CF[sub 4], CHF[sub 3], C[sub 4]F[sub 8], SF[sub 6], SiF[sub 4] and so on. © 2000 American Institute of Physics.


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