Characterization of multilayer reflective coatings for extreme ultraviolet lithography

Wedowski, Marco; Gullikson, Eric M.; Underwood, James H.; Spiller, Eberhard A.; Montcalm, Claude; Kearney, Patrick A.; Bajt, S.; Schmidt, Mark A.; Folta, James A.
June 2000
AIP Conference Proceedings;2000, Vol. 521 Issue 1, p108
Academic Journal
The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2% for reflectivity and 0.002 nm for wavelength. © 2000 American Institute of Physics.


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