Miniaturized optical devices produced by electron beam lithography in lithium fluoride films

Montereali, R. M.
April 2000
AIP Conference Proceedings;2000, Vol. 513 Issue 1, p178
Academic Journal
The use of versatile, well-assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.


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