TITLE

The level position of a deep intrinsic defect in 4H-SiC studied by photoinduced electron paramagnetic resonance

AUTHOR(S)
Zvanut, M. E.; Konovalov, V. V.
PUB. DATE
January 2002
SOURCE
Applied Physics Letters;1/21/2002, Vol. 80 Issue 3, p410
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Photoinduced electron paramagnetic resonance studies performed on nominally semi-insulating, high purity 4H-SiC have revealed charge transfer from an intrinsic defect (ID) to both the shallow boron acceptor and nitrogen donor. At 4 K, incident photon energy between 1.0 and 1.7 eV produces an increase in paramagnetic boron of approximately the same magnitude as the decrease in the paramagnetic defect concentration. For T<80 K, both spectra remain unchanged after removing the light. Illumination with energy greater than 1.8 eV at 4 K increases the nitrogen, boron, and ID spectra simultaneously, but after blocking the light all three signals return to the pre-illumination level. A model based on excitation to and from the bandedges places the defect level 1.1±0.2 eV above the valence bandedge. © 2002 American Institute of Physics.
ACCESSION #
5884250

 

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