Magnetostriction and stress of Ta/(Cu/Co[sub 90]Fe[sub 10])×N/Ta multilayer films

Jo, S.; Seigler, M.
January 2002
Applied Physics Letters;1/7/2002, Vol. 80 Issue 1, p82
Academic Journal
The magnetostriction and stress of multilayer Ta 50 Ã…/(Cu/Co[sub 90]Fe[sub 10]) x N/Ta 50 Ã… films were investigated. As the number of Cu 15 Ã…/CoFe 15 Ã… bilayers was increased, the saturation magnetostriction decreased from -2 x 10[sup -6] at 2 bilayers to -7 x 10[sup -6] at 20 bilayers. A change of CoFe thickness from 5 to 25 Ã… caused a decrease in the magnitude of the magnetostriction of about 1 x 10[sup -6]. Stress measurements showed a decrease in the magnitude of compressive stress from 1 100 MPa to nearly zero as the number of Cu 15 Ã…/CoFe 15 Ã… bilayers increased from 2 to 20. The maximum magnetostrictive anisotropy that could be developed due to nonzero magnetostriction and stress is calculated to be 45.0 Oe when the number of Cu 15 Ã…/CoFe 15 Ã… bilayers is 10.


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