Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction

Chang, Chang-Hwan; Valek, B. C.; Padmore, H. A.; MacDowell, A. A.; Celestre, R.; Marieb, T.; Bravman, J. C.; Koo, Y. M.; Patel, J. R.
May 2000
AIP Conference Proceedings;2000, Vol. 507 Issue 1, p284
Academic Journal
The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-μm width were investigated by using an incident white x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05° sensitivity by the micro Laue diffraction technique.


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