TITLE

Zone-Plate-Array Lithography (ZPAL): Simulations for system design

AUTHOR(S)
Menon, Rajesh; Carter, D. J. D.; Gil, Dario; Smith, Henry I.
PUB. DATE
May 2000
SOURCE
AIP Conference Proceedings;2000, Vol. 507 Issue 1, p647
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We present a simulation study which examines the use of zone plates for lithography. Zone-Plate-Array Lithography (ZPAL) is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns in resist on a substrate. We have demonstrated a working ZPAL system in the UV regime, and are pursuing further experiments with the 4.5 nm X-ray to obtain smaller feature sizes. A general numerical simulation tool, based on the Fresnel-Kirchhoff diffraction theory, has been developed. A pattern will consist of many pixels exposed independently in the resist. Various zone plate and system parameters wilt affect the intensity distribution at the focal plane. We present simulation results which show the effect of these parameters on both the individual spots and exposed patterns.
ACCESSION #
5664342

 

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