TITLE

Enhancement of oxidation rate of a-Si nanoparticles during dehydrogenation

AUTHOR(S)
Das, D.; Farjas, J.; Roura, P.; Viera, G.; Bertran, E.
PUB. DATE
November 2001
SOURCE
Applied Physics Letters;11/26/2001, Vol. 79 Issue 22, p3705
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Oxidation of amorphous silicon (a-Si) nanoparticles grown by plasma-enhanced chemical vapor deposition were investigated. Their hydrogen content has a great influence on the oxidation rate at low temperature. When the mass gain is recorded during a heating ramp in dry air, an oxidation process at low temperature is identified with an onset around 250 °C. This temperature onset is similar to that of hydrogen desorption. It is shown that the oxygen uptake during this process almost equals the number of hydrogen atoms present in the nanoparticles. To explain this correlation, we propose that oxidation at low temperature is triggered by the process of hydrogen desorption. © 2001 American Institute of Physics.
ACCESSION #
5559016

 

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