Dependency of temperature on polarization in CH4/N2 dielectric barrier discharge plasma: A crude assumption

Majumdar, Abhijit; Ghosh, Basudev; Hippler, Rainer
November 2010
Physics of Plasmas;Nov2010, Vol. 17 Issue 11, p113506
Academic Journal
We have investigated the variations of polarization (P) and the temperature (ΔT) at the electrode surfaces during the deposition of C-N layer in CH4/N2 (1:2) dielectric barrier discharge plasma. The reactive deposition process influences the surface temperature, polarization, and the value of the in situ dielectric constant. We have developed a crude model that correlates the surface temperature and surface polarization with thin film properties. We assume that during the thin film deposition process, the atomic mean kinetic energy is equal to the electrostatic energy stored in the electrode surface area. Theoretically estimated temperature is found to agree well with the experimental results. However, the linear model thus developed cannot be used to explain the phenomena in the interfacial polarization stage that requires a nonlinear theory.


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