Electrode modification by electron-induced patterning of aromatic self-assembled monolayers

Felgenhauer, T.; Yan, C.; Geyer, W.; Rong, H.-T.; Go¨lzha¨user, A.; Buck, M.
November 2001
Applied Physics Letters;11/12/2001, Vol. 79 Issue 20, p3323
Academic Journal
Self-assembled monolayers of ω-(4′-methyl-biphenyl-4-yl)-dodecyl thiol [CH[sub 3]–C[sub 6]H[sub 4]-C[sub 6]H[sub 4]–(CH[sub 2])[sub 12]–SH,BP12] on gold were patterned via exposure to 300 eV electrons. Subsequent copper deposition in an electrochemical cell revealed behavior opposite to that of electron beam patterned monolayers of alkanethiols. Whereas alkanethiols act as a positive resist and lead to copper deposition only on irradiated parts, the biphenyl based thiol acts as a negative resist. At the irradiated areas the layer exhibits blocking behavior and copper deposition is observed only on the nonirradiated parts. © 2001 American Institute of Physics.


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