TITLE

Development of ultra-short pulse VUV laser system for nanoscale processing

AUTHOR(S)
Katto, Masahito; Zushi, Hironari; Nagaya, Wataru; Harano, Shinya; Matsumoto, Ryota; Yokotani, Atushi; Kaku, Masanori; Kubodera, Shoichi; Miyanaga, Noriaki
PUB. DATE
November 2010
SOURCE
Applied Physics A: Materials Science & Processing;Nov2010, Vol. 101 Issue 2, p297
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We have developed intense vacuum ultraviolet (VUV) radiation sources for advanced material processing, such as photochemical surface reactions and precise processing on a nanometer scale. We have constructed a new VUV laser system to generate sub-picosecond pulses at the wavelength of 126 nm. A seed VUV pulse was generated in Xe as the 7th harmonic of a 882-nm Ti:sapphire laser. The optimum conversion was achieved at the pressure of 1.2 Torr. The seed pulse will be amplified by the $\mathrm{Ar}_{2}^{*}$ media generated by an optical-field-induced ionization Ar plasma produced by the Ti:sapphire laser. We have obtained a gain coefficient of g=0.16 cm. Our developing system will provide VUV ultra-short pulses with sub-μJ energy at a repetition rate of 1 kHz.
ACCESSION #
54502085

 

Related Articles

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics