Evaporation temperature-tuned physical vapor deposition growth engineering of one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane thin films

Sarkar, I.; Laux, M.; Demokritova, J.; Ruffing, A.; Mathias, S.; Wei, J.; Solovyeva, V.; Rudloff, M.; Naghavi, S. S.; Felser, C.; Huth, M.; Aeschlimann, M.
September 2010
Applied Physics Letters;9/13/2010, Vol. 97 Issue 11, p111906
Academic Journal
We describe the growth of high quality tetrathiofulvalene tetracyanoquinodimethane (TTF-TCNQ) organic charge-transfer thin films which show a clear non-Fermi liquid behavior. Temperature dependent angle resolved photoemission spectroscopy and electronic structure calculations show that the growth of TTF-TCNQ films is accompanied by the unfavorable presence of neutral TTF and TCNQ molecules. The quality of the films can be controlled by tuning the evaporation temperature of the precursor in physical vapor deposition method.


Related Articles

  • Nanostructure engineering in porous columnar thin films: recent advances. John Steele; Michael Brett // Journal of Materials Science: Materials in Electronics;Apr2007, Vol. 18 Issue 4, p367 

    Abstract?? Glancing angle deposition (GLAD) is a physical vapour deposition method used to fabricate highly functional thin films with an engineerable columnar morphology. Recent developments in GLAD technology have produced columnar nanostructures of increased complexity, including periodic,...

  • Geometry Effects on Detonation in Vapor-Deposited Hexanitroazobenzene (HNAB). Tappan, Alexander S.; Wixom, Ryan R.; Knepper, Robert // AIP Conference Proceedings;2017, Vol. 1793 Issue 1, p1 

    Physical vapor deposition is a technique that can be used to produce explosive films with controlled geometry and microstructure. Films of the high explosive hexanitroazobenzene (HNAB) were deposited by vacuum thermal evaporation. HNAB deposits in an amorphous state that crystallizes over time...

  • Calculation of optical and electronic properties of zinc sulfide produced thin layers under different deposition angles. Kangarlou, Haleh; Abdollahi, Arash; Aghgonbad, Maryam // Optics & Spectroscopy;Sep2012, Vol. 113 Issue 3, p321 

    Zinc sulfide nano layers were deposited on glass substrates at 300 K by physical vapor deposition method, under high vacuum conditions and different deposition angles. Thickness of the layers were measured 73 nm, by quartz crystal method. Optical reflectance and transmittance of the layers were...

  • Structural and optical properties of vanadium oxides prepared by microwave-assisted reactive magnetron sputtering. SIERADZKA, KAROLINA; WOJCIESZAK, DAMIAN; KACZMAREK, DANUTA; DOMARADZKI, JAROSLAW; KIRIAKIDIS, GEORGE; APERATHITIS, ELIAS; KAMBILAFKA, VICKY; PLACIDO, FRANK; SONG, SHIGENG // Optica Applicata;2011, Vol. 41 Issue 2, p463 

    In this work, structural and optical properties of vanadium oxides have been presented. Thin films were manufactured by microwave-assisted magnetron sputtering process. Particles were sputtered from a vanadium target in Ar/O2 atmosphere. Oxygen partial pressure was changing from 3x10-4 to 7x10-4...

  • Preparation and characterization of obliquely deposited copper oxide thin films. F. Chaffar Akkari; M. Kanzari; B. Rezig // European Physical Journal - Applied Physics;Oct2007, Vol. 40 Issue 1, p49 

    When a thin film is deposited by physical vapour deposition, with the vapour flux arriving at an oblique angle from the substrate normal, and under conditions of sufficiently limited adatom mobility to create a columnar microstructure, the resulting structure is somewhat porous and grows at an...

  • Compositional dependence of Raman scattering and photoluminescence emission in Cu[sub x]Ga[sub y]Se[sub 2] thin films. Xue, C.; Papadimitriou, D.; Raptis, Y. S.; Esser, N.; Richter, W.; Siebentritt, S.; Lux-steiner, M. Ch. // Journal of Applied Physics;10/1/2003, Vol. 94 Issue 7, p4341 

    Raman scattering and photoluminescence (PL) emission of Cu[sub x]Ga[sub y]Se[sub 2] thin films, grown by metalorganic chemical vapor deposition (MOCVD) on GaAs (100) and by physical vapor deposition (PVD) on Glass/Mo substrates, were studied at room and low temperatures as a function of...

  • In situ lateral patterning of thin films of various materials deposited by physical vapor deposition. Chi Zhang; Kalyanaraman, Ramki // Journal of Materials Research;Feb2004, Vol. 19 Issue 2, p595 

    An approach to pattern directly thin films of various materials deposited by different physical vapor deposition methods is presented. Co and Ag films deposited by pulsed laser deposition and a-beam evaporation, respectively, were fabricated into 650- and 1000-nm-spaced parallel stripes on...

  • In-situ nanostructured film formation during physical vapor deposition. Chi Zhang; Kalyanaraman, Ramki // Applied Physics Letters;12/8/2003, Vol. 83 Issue 23, p4827 

    An approach to directly make controlled nanostructured films in situ with physical vapor thin film deposition is presented. Co films were formed into lines with 3.2±0.8 nm thickness and were regularly spaced 550±20 nm apart on a Si(100) surface. The line pattern results during pulsed laser...

  • Combinatorial investigation of (Ti1-xNbx)2AlC. Scabarozi, T. H.; Gennaoui, C.; Roche, J.; Flemming, T.; Wittenberger, K.; Hann, P.; Adamson, B.; Rosenfeld, A.; Barsoum, M. W.; Hettinger, J. D.; Lofland, S. E. // Applied Physics Letters;9/7/2009, Vol. 95 Issue 10, p101907 

    We have synthesized thin films of (Ti1-xNbx)2AlC by combinatorial method on TiC (111) seed layers grown on c-axis sapphire (Al2O3) substrates at 900 °C using magnetron sputter. X-ray diffraction showed the films to be c-axis oriented and epitaxial, and films contained a minor secondary phase...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics