TITLE

Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics

AUTHOR(S)
Ren, H.; Sinha, H.; Sehgal, A.; Nichols, M. T.; Antonelli, G. A.; Nishi, Y.; Shohet, J. L.
PUB. DATE
August 2010
SOURCE
Applied Physics Letters;8/16/2010, Vol. 97 Issue 7, p072901
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The surface potential due to charge accumulation during vacuum ultraviolet irradiation of high-k and low-k thin dielectric films is measured. Measurement of the substrate current, which is the sum of the charge-accumulation and photoinjection currents, allows an in situ monitoring of the charge accumulation during irradiation. The relationship between the substrate current and the calculated in situ surface potential is also found, eliminating the need for a separate surface-potential measurement. With a high photon dose, the surface potential and substrate current reach a steady-state value with no further net charge accumulation.
ACCESSION #
52997975

 

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