Ultraviolet radiation effects on paramagnetic defects in low-κ dielectrics for ultralarge scale integrated circuit interconnects

Bittel, B. C.; Lenahan, P. M.; King, S. W.
August 2010
Applied Physics Letters;8/9/2010, Vol. 97 Issue 6, p063506
Academic Journal
The electronic properties of low-κ interlayer dielectric and etch stop layers are important issues in ultralarge scale integrated circuits development. Leakage currents are critical problems that are not well understood. A topic of current interest is ultraviolet curing of these films. We report on electron spin resonance and electrical measurements of low-κ films with and without ultraviolet exposure. This work provides fundamental understanding of the deep level defects likely involved in leakage currents.


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