Femtosecond laser fabrication of high reflectivity micromirrors

Brodoceanu, D.; Cole, G. D.; Kiesel, N.; Aspelmeyer, M.; Bäuerle, D.
July 2010
Applied Physics Letters;7/26/2010, Vol. 97 Issue 4, p041104
Academic Journal
High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry–Pérot interferometry; a finesse in excess of 8900±700, corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.


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