Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Ya-Peng Fang; Wei He; Hao-Liang LiuSTM; Qing-Feng Zhan; Hai-Feng Du; Qiong Wu; Hai-Tao Yang; Xiang-Qun Zhang; Zhao-Hua Cheng
July 2010
Applied Physics Letters;7/12/2010, Vol. 97 Issue 2, p022507
Academic Journal
We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku=1.7×105 erg/cm3, which is consistent with Kshape=1.1×105 erg/cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.


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