Giant microwave photoresistance of two-dimensional electron gas

Ye, P. D.; Engel, L. W.; Tsui, D. C.; Simmons, J. A.; Wendt, J. R.; Vawter, G. A.; Reno, J. L.
October 2001
Applied Physics Letters;10/1/2001, Vol. 79 Issue 14, p2193
Academic Journal
We measure microwave frequency (4–40 GHz) photoresistance at low magnetic field B, in high mobility two-dimensional electron gas samples, excited by signals applied to a transmission line fabricated on the sample surface. Oscillatory photoresistance vs B is observed. For excitation at the cyclotron resonance frequency, we find a giant relative photoresistance ΔR/R of up to 250%. The photoresistance is apparently proportional to the square root of applied power, and disappears as the temperature is increased. © 2001 American Institute of Physics.


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