Energy level evolution of air and oxygen exposed molybdenum trioxide films

Irfan; Huanjun Ding; Yongli Gao; Small, Cephas; Do Young Kim; Subbiah, Jegadesan; So, Franky
June 2010
Applied Physics Letters;6/14/2010, Vol. 96 Issue 24, p243307
Academic Journal
The evolution of electronic energy levels of controlled air and oxygen exposed molybdenum trioxide (MoO3) films has been investigated with ultraviolet photoemission spectroscopy, inverse photoemission spectroscopy, and x-ray photoemission spectroscopy. We found that while most of the electronic levels of as deposited MoO3 films remained largely intact, the reduction in the work function (WF) was substantial. The gradual surface WF change from 6.8 to 5.3 eV was observed for air exposed film, while oxygen exposed film the surface WF saturated at ∼5.7 eV. Two distinct stages of exposure are observed, the first dominated by oxygen adsorption for <1013 Langmuir (L) exposure and at the final step moisture absorption >1013 L.


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