TITLE

Studying Ni-B alloys with X-ray photoelectron spectroscopy

AUTHOR(S)
Bekish, Yu. N.; Gaevskaya, T. V.; Tsybulskaya, L. S.; Goo-Yul Lee; Kim, Man
PUB. DATE
May 2010
SOURCE
Protection of Metals & Physical Chemistry of Surfaces;May2010, Vol. 46 Issue 3, p325
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Ni and Ni-B films that contain 4–20 at % boron are produced by electroplating from baths containing sodium decahydroclovodecarborate and borane-morpholine as boron sources. The chemical state of Ni, B, and O atoms on the original film surface, as well as in that etched to 1 μm or annealed in air at 700°C was determined using X-ray photoelectron spectroscopy (XPS). Judging from the absolute values and directions of the peak shifts in XPS spectra of freshly obtained films, it is assumed that Ni and B atoms chemically interact with each other and Ni-Ni bonds are replaced by shorter Ni-B bonds. Boron is segregated in the surface layer of Ni-B films and hampers the thermal oxidation of nickel.
ACCESSION #
51165295

 

Related Articles

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics