TITLE

Nanograss and nanostructure formation on silicon using a modified deep reactive ion etching

AUTHOR(S)
Mehran, M.; Mohajerzadeh, S.; Sanaee, Z.; Abdi, Y.
PUB. DATE
May 2010
SOURCE
Applied Physics Letters;5/17/2010, Vol. 96 Issue 20, p203101
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Silicon nanograss and nanostructures are realized using a modified deep reactive ion etching technique on both plane and vertical surfaces of a silicon substrate. The etching process is based on a sequential passivation and etching cycle, and it can be adjusted to achieve grassless high aspect ratio features as well as grass-full surfaces. The incorporation of nanostructures onto vertically placed parallel fingers of an interdigital capacitive accelerometer increases the total capacitance from 0.45 to 30 pF. Vertical structures with features below 100 nm have been realized.
ACCESSION #
50827879

 

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