Dielectric constants of atomically thin silicon channels with double gate

Kageshima, Hiroyuki; Fujiwara, Akira
May 2010
Applied Physics Letters;5/10/2010, Vol. 96 Issue 19, p193102
Academic Journal
Dielectric constants of Si (111) nanofilms with the double gate are studied in the full inversion regime by using the first-principles calculation. The calculations show that the dielectric constants are significantly smaller than that of the bulk. Further, the dielectric constants depend on the conduction type as well as on the film thickness. They also oscillate with a 2-bilayer-thickness for the p-channel case as the film thickness decreases. The suppressed dielectric constants are found in the channel center as well as in the channel surface. These findings open the way to artificial control of the dielectric constant in semiconductor nanostructures.


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