TITLE

Comment on “Effect of current crowding on vacancy diffusion and void formation in electromigration” [Appl. Phys. Lett. 76, 988 (2000)]

AUTHOR(S)
Lloyd, J. R.
PUB. DATE
August 2001
SOURCE
Applied Physics Letters;8/13/2001, Vol. 79 Issue 7
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Comments on the effect of current crowding on vacancy diffusion and void formation in electromigration. Discussion on the concept of a driving force for vacancy diffusion; Difficulty in rationalizing the employment of electromigration effective valence; Elaboration on the presence of vacancies.
ACCESSION #
4972058

 

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