TITLE

Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition

AUTHOR(S)
Grill, A.; Patel, V.
PUB. DATE
August 2001
SOURCE
Applied Physics Letters;8/6/2001, Vol. 79 Issue 6
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Carbon-doped oxide materials (SiCOH films) with ultralow dielectric constants have been prepared by plasma-enhanced chemical vapor deposition (PECVD) from mixtures of SiCOH precursors with organic materials. The films have been characterized by Rutherford backscattering and forward recoil elastic scattering analysis, Fourier transform infrared spectroscopy and index of refraction measurements, and measurement of step heights in the films. The electrical properties of the films have been measured on metal–insulator–silicon structures. By proper choice of the precursor and deposition conditions, the dielectric constants of the SiCOH films can be reduced to values below 2.1, demonstrating the extendibility of PECVD-prepared carbon-doped oxides as the interconnect dielectrics for future generation of very large scale integrated chips. © 2001 American Institute of Physics.
ACCESSION #
4936909

 

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