TITLE

Comment on “High-resolution electron microscopy investigations on stacking faults in SrBi[sub 2]Ta[sub 2]O[sub 9] ferroelectric thin films” [Appl. Phys. Lett. 78, 973 (2001)]

AUTHOR(S)
Zurbuchen, M. A.; Schlom, D. G.; Streiffer, S. K.
PUB. DATE
August 2001
SOURCE
Applied Physics Letters;8/6/2001, Vol. 79 Issue 6
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Comments on the high-resolution electron microscopy investigations on stacking faults in strontium-bismuth-tantalum-oxygen (SrBi[sub 2]Ta[sub 2]O[sub 9] ferroelectric thin films. Definition of the imaging condition; Observation on the c-direction spacing of potential stacking faults; Direction of grain's image.
ACCESSION #
4936880

 

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