TITLE

Contactless mobility measurements of inversion charge carriers on silicon substrates with SiO2 and HfO2 gate dielectrics

AUTHOR(S)
Everaert, J. L.; Rosseel, E.; Dekoster, J.; Pap, A.; Meszaros, A.; Kis-Szabo, K.; Pavelka, T.
PUB. DATE
March 2010
SOURCE
Applied Physics Letters;3/22/2010, Vol. 96 Issue 12, p122906
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A method is described to determine the mobility of inversion charge carriers on Si substrates with SiO2 and HfO2 gate dielectrics. It is a completely contactless method combining corona charge and charge spreading metrology. [Patent Application Nos. EP 07118673 and U.S. 60940594.] It is shown that from such measurements mobility of inversion charge carriers can be calculated as a function of the effective electric field. The resulting mobility curves are comparable to those found in transistors.
ACCESSION #
48837197

 

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