Selective adsorption and patterning of Si nanoparticles fabricated by laser ablation on functionalized self-assembled monolayer

Hata, K.; Fujita, M.; Yoshida, S.; Yasuda, S.; Makimura, T.; Murakami, K.; Shigekawa, H.; Mizutani, W.; Tokumoto, H.
July 2001
Applied Physics Letters;7/30/2001, Vol. 79 Issue 5
Academic Journal
We demonstrate an in situ selective adsorption of Si nanoparticles fabricated by laser ablation on a functionalized self-assembled monolayer (SAM). Si nanoparticles adsorbed on –CH[sub 3] terminated a SAM while Si particles did not adsorb on –NH[sub 2], –F, –OH, and –COOH, terminated SAMs. The end group of a SAM solely determines the selectivity against Si nanoparticle adsorption. We utilized the screening ability of functionalized SAMs to pattern Si nanoparticles onto desired locations on a Si substrate. © 2001 American Institute of Physics.


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